| 摘要 |
PURPOSE:To obtain a heater capable of uniformly heating a semiconductor substrate by periodically moving a reflecting plate installed to a light source or near the light source. CONSTITUTION:A reflecting plate 14 mounted to a periodically shifting light source 13 or near the light source 13 is set up to a semiconductor manufacturing apparatus thermally treating a semiconductor substrate 11 by the light source 13. A semiconductor substrate susceptor 12, the light source such as a halogen lamp light source 13, the reflecting plate 14, a rotary mechanism 15, etc. turning the halogen lamp light source 13 and the reflecting plate 14 are fitted, and the number of revolution of the rotary mechanism 15 is brought to a value such as 30rpm. The halogen lamp 13 and the reflecting plate 14 are rotated by the rolling mechanism 15 during a time when the semiconductor substrate 11 is heated. Accordingly, the semiconductor substrate can be heated equally, thus making the P-N junction depth of a semiconductor element and the resistivity of an ion-implanted layer uniform in the semiconductor substrate, then improving yield on manufacture and reliability of a semiconductor device. |
