| 摘要 |
PURPOSE:To polish a thin membrane magnetic head or the like with a high degree of accuracy, by embedding monitors made from resistors in both end parts of a surface to be polished to simultaneously polish them so that the condition of processing and the accuracy of polishing are diagramatically displayed in accordance with variations in resistance of the monitors, CONSTITUTION:Rectangular pattern monitors (g, h) made from resistors are embedded in both longitudinal end parts of thin membrane magnetic head blocks 1 through 5 held in a holder 4, and are polished together with the blocks by rotating a stool 8. D.C. current running through the monitors (g, h) is monitored by a resistance measuring circuit 121 through an interface circuit 124, and computed resistance values are stored in memory 116 in a processing section 11 while a standard resistance value from memory 112 is compared with the measured resistance values by means of a comparing circuit 114. The difference obtained by the comparison and the difference in resistance between both monitors are delivered to a MPU 111 for obtaining a processed amount and a processing accuracy and for diagramatically processing the values to diagramatically display them on a display device 12. Thus, it is possible to polish a workpiece in a short time with a high degree of accuracy. |
