REMOVING SOLUTION

摘要

PURPOSE:To easily remove a photoresist and a protective film for rear side etching and to enable washing with water after the removal by using a removing soln. contg. imidazolidinones. CONSTITUTION:This removing soln. contains imidazolidinones. The imidazolidinones used are compds. each having a carbonyl group introduced into the imidazoline skeleton such as 2-, 3- or 4-imidazoline or derivs. of the compds. and they are preferably represented by formula I (where each of R<1> and R<2> is H or 1-3C alkyl and R<3> is H or methyl). The pref. amount of the imidazolidinones in the removing soln. is 5-90wt%. A photoresist and a protective film for rear side etching can be easily removed with the removing soln. and washing with water after the removal is enabled.