| 摘要 |
Process and device for coating substrates (11) within a closed chamber, which is under a protective gas atmosphere, with a plurality of layers and for etching by means of at least two containers (2, 3) in which liquids (5, 6) are disposed which interact with the substrates (11). The substrates are attached to a rotating conveying device with a horizontal shaft (1) and retaining elements (10) projecting from said shaft (1). The retaining elements move the substrates on arcuate paths successively through the containers (2, 3) which are open at the top, are disposed below the shaft (1) and one behind the other in the direction of the shaft (1), with intermittent immersion of the substrates in the liquids (5, 6). For large-scale industrial production of correspondingly treated substrates, the shaft (1) is subdivided into shaft sections (1a, 1b, 1c) and the latter, with the substrates (11), are introduced, in continuous or codirectionally gradual passage, from the outside into the protective gas atmosphere and, after the removal of the substrates from the last container, are led out of the protective gas atmosphere to the outside again in the same direction of motion. <IMAGE>
|
