发明名称 |
SEMICONDUCTOR MEMORY AND METHOD FOR FABRICATING THE SAME |
摘要 |
A semiconductor memory having a capacitor formed by utilizing a groove formed in a semiconductor substrate and an insulated gate field effect transistor and suppressing expansion of a depletion layer from the groove, and a method for fabricating the same are disclosed. An area occupied by each memory cell can be made very small and a distance between the memory cells can also be made very small, accordingly, high density integration is facilitated. |
申请公布号 |
DE3375541(D1) |
申请公布日期 |
1988.03.03 |
申请号 |
DE19833375541 |
申请日期 |
1983.02.09 |
申请人 |
HITACHI, LTD. |
发明人 |
SUNAMI, HIDEO;KURE, TOKUO;KAWAMOTO, YOSHIFUMI |
分类号 |
G11C11/404;H01L21/82;H01L27/10;H01L27/108;(IPC1-7):H01L27/10 |
主分类号 |
G11C11/404 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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