发明名称 SEMICONDUCTOR MEMORY AND METHOD FOR FABRICATING THE SAME
摘要 A semiconductor memory having a capacitor formed by utilizing a groove formed in a semiconductor substrate and an insulated gate field effect transistor and suppressing expansion of a depletion layer from the groove, and a method for fabricating the same are disclosed. An area occupied by each memory cell can be made very small and a distance between the memory cells can also be made very small, accordingly, high density integration is facilitated.
申请公布号 DE3375541(D1) 申请公布日期 1988.03.03
申请号 DE19833375541 申请日期 1983.02.09
申请人 HITACHI, LTD. 发明人 SUNAMI, HIDEO;KURE, TOKUO;KAWAMOTO, YOSHIFUMI
分类号 G11C11/404;H01L21/82;H01L27/10;H01L27/108;(IPC1-7):H01L27/10 主分类号 G11C11/404
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