发明名称 Method and apparatus for controlling the organic contamination level in an electroless plating bath.
摘要 <p>An electroless plating bath (11) is selectively cleaned of organic contaminants. The organic contaminants are detected by measuring the capacitance between a working electrode (26) and counter electrode (27) with a potentiostat (31). The capacitance measurements are used to indicate the level of organic contaminants. Exposure of the dummy plating surface (39) in the electroless plating bath is controlled such that the exposed surface is directly proportional to the detected level of organic contaminants.</p>
申请公布号 EP0257197(A2) 申请公布日期 1988.03.02
申请号 EP19870106898 申请日期 1987.05.12
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 MCBRIDE, DONALD GENE;RICKERT, ROBERT GEORGE
分类号 C23C18/31;C23C18/16;C23C18/40;H05K3/18 主分类号 C23C18/31
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