发明名称 |
Method and apparatus for controlling the organic contamination level in an electroless plating bath. |
摘要 |
<p>An electroless plating bath (11) is selectively cleaned of organic contaminants. The organic contaminants are detected by measuring the capacitance between a working electrode (26) and counter electrode (27) with a potentiostat (31). The capacitance measurements are used to indicate the level of organic contaminants. Exposure of the dummy plating surface (39) in the electroless plating bath is controlled such that the exposed surface is directly proportional to the detected level of organic contaminants.</p> |
申请公布号 |
EP0257197(A2) |
申请公布日期 |
1988.03.02 |
申请号 |
EP19870106898 |
申请日期 |
1987.05.12 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
MCBRIDE, DONALD GENE;RICKERT, ROBERT GEORGE |
分类号 |
C23C18/31;C23C18/16;C23C18/40;H05K3/18 |
主分类号 |
C23C18/31 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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