METHOD OF FORMING A RESIST MASK RESISTANT TO PLASMA ETCHING,申请号EP19830200698-传众专利搜索

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发明名称	METHOD OF FORMING A RESIST MASK RESISTANT TO PLASMA ETCHING
摘要
申请公布号	EP0095212(B1)	申请公布日期	1988.03.02
申请号	EP19830200698	申请日期	1983.05.17
申请人	PHILIPS ELECTRONIC AND ASSOCIATED INDUSTRIES LIMITED;N.V. PHILIPS' GLOEILAMPENFABRIEKEN	发明人	MEYER, JOSEPH;VINTON, DAVID JOHN
分类号	C23F4/00;G03F7/26;G03F7/40;H01L21/027;(IPC1-7):G03F7/26	主分类号	C23F4/00
代理机构		代理人
主权项
地址

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