发明名称 |
POLYAMIC ACID COPOLYMER SOLUTIONS FOR IMPROVED SEMICONDUCTOR MANUFACTURING |
摘要 |
<p>A polyamic acid copolymer forming a polyimide comprising, in mole percent, from greater than 5 percent to about 45 percent pyromellitic dianhydride, from about 5 percent to about 45 percent oxydiphthalic dianhydride, and about 50 percent of oxydianiline. Polyimides formed by curing the copolymer are also disclosed as is a process for forming a heat sealable coating on or dielectric isolation layer within electronic circuitry using the copolymer.</p> |
申请公布号 |
EP0154720(B1) |
申请公布日期 |
1988.03.02 |
申请号 |
EP19840116317 |
申请日期 |
1984.12.27 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
LINDE, HAROLD GEORGE;MACINTYRE, MICHAEL WILFORD;MOTSIFF, WILLIAM THOMAS |
分类号 |
C08G73/00;C08G73/10;H01B3/30;H01L21/312;H01L23/29;H01L23/31;(IPC1-7):H01B3/30 |
主分类号 |
C08G73/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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