首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
PATTERN SHAPE MEASURING METHOD
摘要
申请公布号
JPS6348411(A)
申请公布日期
1988.03.01
申请号
JP19860194563
申请日期
1986.08.19
申请人
NEC CORP
发明人
HASEGAWA SHINYA
分类号
G01B15/00;H01L21/66
主分类号
G01B15/00
代理机构
代理人
主权项
地址
您可能感兴趣的专利
ELECTRO-OPTICAL LIGHT DEFLECTING ELEMENT
ELECTRON BEAM LITHOGRAPHY METHOD
DOUBLE LEAF VALVE
VIBRATION TUBE BODY CONVERTER
NEUTRALIZATION OF ACIDIC WATER LAYER ON PRECIPITATE CONTAINING HUMIC SUBSTANCE
FOERFARANDE OCH ANORDNING FOER UPPRESNING AV TILLPLATTADE PARALLELLEPIPEDISKA AEMNEN.
PROCESS FOR PRODUCING HYDROPHOBIC CIS-PLATINUM COMPLEXES AND INCORPORATING THEM IN LIPOSOMES
PROCESS FOR WORKING UP 4-NITRO-ACETOPHENON MOTHER LIQUOURS CONTAINING DINITRO-ETHYL-BENZENE
MODULAR-FRAME BUILDING CONSTRUCTION OF SELF-SUSTAINING SHELL ROOF
PROCESS FOR PRODUCTION OF SATURATED TRICYCLIC DIONS CONTAINING NITROGEN AND MEDICAL PREPARATIVES CONTAINING THESE SUBSTANCES
PROCESS FOR PRODUCING NEW THIENOPYRIDINONES AND PHARMACEUTICAL COMPOSITIONS COMPRISING SAME
PROCESS FOR PRODUCING SUBSTITUTED PROPAN-PHOSPHINIC ACID COMPOUNDS AND PHARMACEUTICAL COMPOSITIONS CONTAINING THEM
BUFFERING SYSTEM
MAGNETIC RESISTANCE SENSOR FOR MAGNETIC ENCODER
HUMIDIFYING AND RICE POLISHING MACHINE
SYSTEM AND DEVICE FOR CHARGING BY PREPAID CARD FOR COMMUNICATION SYSTEM
MANUFACTURE OF SEMICONDUCTOR LASER ELEMENT AND VAPOR PHASE EPITAXY APPARATUS USED IN SAID MANUFACTURE
INTEGRATED CIRCUIT DESIGNING TECHNIQUE
FLOW RATE DETECTOR
SEMICONDUCTOR LASER ELEMENT
