| 摘要 |
PURPOSE:To use semiconductor laser beams low in output and to form a lithographic plate high in resolution and printing resistance and free from background stains with high sensitivity by forming an antihalation means under emulsion layers, exposing the lithographic plate to the scanning light of >=700nm wavelength, and processing it with a developing solution containing thiocyanate. CONSTITUTION:The lithographic plate material has on a support at least the silver halide emulsion layer containing silver halide grains composed of at least silver bromide and a sensitizing dye having maximum spectral sensitivity in a long wavelength region of >=700nm in an amount of 3X10<-5>-3X10<-4>mol per mol of silver halide, and a physical development nucleus layer as a surface layer, and further, the antihalation means having a reflectivity of 13-40% of the scanning exposure light. This plate material is exposed to the high- illuminance short-time scanning exposure light of >=700nm wavelength and processed with the developing solution containing at least the thiocyanate for use in the silver complex salt diffusion transfer process. |
