| 摘要 |
PURPOSE:To carry out high-purity surface treatment with good uniformity for a long time by providing a means for sending a purge gas along the inner wall of an electric discharge chamber to reduce the damage of the discharge chamber. CONSTITUTION:A reaction active species purge mechanism is formed with a gas separation barrier 20, a purge gas passage 21, and a purge gas inlet valve 30. A discharge gas is introduced from a valve 9, an electric power is impressed on a coil 7, hence the discharge gas is excited, and a large amt. of reaction active species are generated. At this time, the purge gas not etching the inner wall material of the discharge chamber 1 such as O2, N2, and Ar is blown off along the inner wall of the discharge chamber 1 from the inlet valve 30 through the purge gas passage 21 to reduce the concn. of the reaction active species in the vicinity of the inner wall. Consequently, the damage of the inner wall material of the discharge chamber 1 by the reaction active species is reduced. Moreover, the amt. of the impurities discharged from the inner wall of the discharge chamber is reduced, and good-quality fast surface treatment can be carried out while reducing the deposition of impurities on the substrate surface and the mixing of impurities into the surface. |
