发明名称 MIS-TYPE TRANSISTOR AND MANUFACTURE THEREOF
摘要 PURPOSE:To obtain the high-performance minute MOS comprising high pressure resistance and high driving capabilty by using a gate having a triple structure to alleviate a potential gradient in adjacency of the drains and to strengthen an electric field in adjacency of the sources. CONSTITUTION:The gate is composed of a control gate 1, a drain field control gate 2 and a source field control gate 3 formed on both sides of the gate 1 respectively. A source 4 and a drain 5 are composed of the well-known structures. The drain field control gate 2 generates a new electric field in adjacency of the drain to alleviate the potential gradient in adjacency of the drain. The source field control gate generates a new electric field in adjacency of the source in vertical direction to the channel, thereby reducing a potential barrier controlling the drain current in adjacency of the source to increase the drain current.
申请公布号 JPS59200465(A) 申请公布日期 1984.11.13
申请号 JP19830072947 申请日期 1983.04.27
申请人 TOSHIBA KK 发明人 YOSHIMI MAKOTO
分类号 H01L29/78;(IPC1-7):H01L29/78 主分类号 H01L29/78
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