发明名称 BEAM PROFILE MEASURING APPARATUS FOR CHARGED PARTICLE BEAM
摘要 <p>PURPOSE:To reduce measuring time with higher spatial resolutions, by detecting the level of hourly variation in the quantity of electric charge electrostatically induced in a number of electrodes arranged in the perimeter of an area where charged particle beams pass. CONSTITUTION:An area where a charged particle beam 1 passes is divided into 16 squares to set analyzing spaces 5 and sixteen electrodes 4 are arranged on a circumference surrounding the area. The quantity of electric charge electrostatically induced in the electrodes 4 by the beam 1 is detected as voltage signal proportional to the quantity of the electric charge through a signal processing circuit 16 separately to be applied to a matrix computation processing circuit 13. A memory circuit 12 for storing all elements of the matrix is connected to the circuit 13 and a matrix computation is performed with the circuit 13 according to a specified formula based on an output signal of the circuit 16 and a matrix stored in the circuit 12. An image processing computer 14 receives the results of computation, namely, the quantity of electricity flowing to centers of gravity to perform a specified image processing to show a beam profile on a display 15.</p>
申请公布号 JPS6344190(A) 申请公布日期 1988.02.25
申请号 JP19860189134 申请日期 1986.08.11
申请人 KOBE STEEL LTD 发明人 INOUE KENICHI;ISHIBASHI KIYOTAKA;KUSAKA TAKUYA;KAWADA YUTAKA
分类号 G01N23/225;G01T1/29 主分类号 G01N23/225
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