| 摘要 |
<p>A coating and developing system, a coating and developing method, and a storage medium are provided to adjust easily a processing speed by increasing or reducing the number of processing blocks arranged between a carrier block and an interface block. A processing station is installed between a carrier block(S1) and an interface block(S6) and includes at least two processing blocks of the same construction. Each of the processing blocks is built by stacking a plurality of unit blocks including a film forming unit block and a developing unit block, and is arranged longitudinally contiguously between the carrier block on a front side and the interface block on a back side along a substrate carrying passage of a substrate. A transfer unit group is installed at a position corresponding to each unit block in a front side within the processing blocks in order to transfer a substrate between the stacked unit blocks of the processing blocks. The transfer unit group includes a plurality of transfer units for transferring the substrate by using a substrate carrying unit of each unit block. Transfer arms(D1,D2,D3) are installed at the processing blocks, respectively. Inlet/outlet transfer units are installed to transfer the substrate between the carrier block and the processing block or between the adjacent processing blocks. Direct carrying unit is installed in each of the processing blocks in order to carry the substrate exclusively between the inlet and outlet transfer unit of the processing block and the inlet and outlet transfer unit of the processing block behind and adjacent to the prior processing block.</p> |
