| 摘要 |
PURPOSE:To make the temp. of a vapor source lower and to form a thin film having good quality by providing a device equipped with a fine hole for ejecting an activating gas of a depositing material into a vacuum chamber and a mechanism for preventing ejection of ions and atoms from the fine hole by the electromagnetic field. CONSTITUTION:An activating gas generator 9 having a fine hole 13 is connected to a vacuum chamber 1 contg. a substrate 3, and an electromagnet 10 and electrodes 11, 12 are provided therein. An element to be deposited is introduced from a gas introducing mechanism 8 into the generator 9, and a voltage is impressed to electrodes 11, 12 for generating plasma to generate glow discharge between the electrodes 11 and 12, thereby generating plasma. The molecular seed decomposed and activated by the plasma is ejected from the hole 13 to the substrate 3. The ejection of ions and electrons in the plasma is prevented by the electromagnet 10 in this stage so that only the neutral particles are ejected from the hole 13. The temp. of the vapor source is thus made low and the contamination from the periphery is prevented and therefore a satisfactory thin film is formed on the substrate 3. |
