APPARATUS FOR PROCESSING A SUBSTRATE HAVING AN AIR CONDITIONING SYSTEM

摘要

The substrate processing apparatus having heating ventilation and cooling system is provided to perform the cold treatment by cooling plate, the bake process by the heating plate or the photoresist reflow process at the same time. The first processing block(100) is equipped in order to perform the coating process and photolithography process. The first processing block is opposite to the second processing block(200) for heat-treating the substrates. The main feed block(300) for transferring substrates is arranged between the first processing block and the second processing block. The intake duct is installed in the vertical direction between the second processing block and the main feed block.