| 摘要 |
<p>PURPOSE:To secure cleaness of wafers, by supporting a wafer casette vertically in a rotatable casette stage so as to expose it to clean down-flow air. CONSTITUTION:A wafer casette 1 is received in a rotatable casette stage 2 of an automatic loader and is exposed to clean down-flow air passing through filter 4 and apertures in the bottom of the stage. When the casette 1 is ready to be introduced into a vacuum treatment unit 5, a stage support 3 is lowered by means of an elevator mechanism comprising a motor 6, a bolt 7 and a guide rod 8 and the stage 2 is rotated by a lever 9 distant from a follower 10 so that the casette 1 is positioned horizontally and introduced into the chamber 5 by means of a wafer conveyor belt 11. In this manner, it is possible to obtain an automatic loader capable of ensuring cleaness of wafers.</p> |
