摘要 |
An image sensor and a manufacturing method thereof are provided to prevent a bridge of a micro lens by forming a groove on a planarization layer of a pixel boundary. A photo diode and a circuit are formed on a substrate(110). A color filter layer(130) is formed on the photo diode. A planarization layer(140) is formed on the color filter layer. A photosensitive pattern for a micro lens is formed on the planarization layer, exposes a boundary between pixels, is ashed, and forms a groove in a boundary between pixels of the planarization layer. An ashed photosensitive pattern for the micro lens fills the groove, and forms a micro lens(160) on the planarization layer. |