发明名称 Apparatus for the treatment of substrates in a gas stream
摘要 PCT No. PCT/DE86/00304 Sec. 371 Date Jan. 7, 1987 Sec. 102(e) Date Jan. 7, 1987 PCT Filed Jul. 24, 1986 PCT Pub. No. WO87/00767 PCT Pub. Date Feb. 12, 1987.In an apparatus for the treatment of substances in a gas stream, in particular for the absorption and/or adsorption or filtering of gases, a plurality of annular treatment spaces, which are arranged concentric to a vertical axis in each case and are used for receiving a treatment medium and which divide the inner space of a casing of the apparatus into a first and a second chamber, are provided one above the other. Each treatment space has fresh treatment medium supplied to it at an upper opening in each case by way of at least one duct. An evacuation apparatus for removing the treatment medium is provided at the lower outlet opening of each treatment space. The treatment spaces form a unit which is driven in a rotating manner about the vertical axis, and the duct and preferably also the evacuation apparatus are arranged fixed for supplying fresh treatment medium so that in particular as the treatment medium is supplied a uniform distribution of the medium over the entire interior of each treatment space can be achieved.
申请公布号 US4726821(A) 申请公布日期 1988.02.23
申请号 US19870025149 申请日期 1987.01.07
申请人 ANDRE BUECHL KALK- UND PORTLANDZEMENTWERK 发明人 SGASLIK, FRIEDRICH
分类号 B01D46/34;B01D53/08;B01J8/10;B01J8/12;(IPC1-7):B01D33/20;B01D23/24 主分类号 B01D46/34
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