| 摘要 |
PURPOSE:To improve the accuracy of the absorber pattern of an X-ray mask, and to reduce defect density by manufacturing a plating stencil used when the pattern is formed through gold plating by boron nitride hydride, boron carbide nitride hydride or silicon nitride. CONSTITUTION:An alumina ring 2 is fast stuck to the peripheral section of one surface of an silicon substrate 1, and an X-ray transmitting membrane 3 composed of boron nitride carbide hydride is formed on the surface on the reverse side of the substrate 1. The silicon substrate 1 from which the lower section of the ring 2 is removed is etched to expose the membrane 3 in a region surrounded by the ring 2. Tantalum/gold/tantalum are evaporated on the surface of the membrane 2 on the side reverse to the ring 2 in succession to shape a plating base 4, boron nitride carbide hydride 5 is film-formed onto the plating base 4, and the upper section of 5 is coated with silicon-on-glass SOG 6 and a resist 7. The boron nitride carbide hydride film 5 is patterned to shape a plating stencil 5', an X-ray absorber is formed through the plating of gold, using the plating stencil 5' as a mask, and the stencil 5' and the plating base 4 are removed. |
