发明名称 |
Gain-controlled light-emitting semiconductor structure, and a method for its production |
摘要 |
The invention relates to a gain-controlled light-emitting semiconductor structure and to a method for its production. In this case, a narrow current path is initially produced with the aid of a V-groove diffusion technology which is known per se. The V-groove is subsequently etched away so that a planar contact-making surface is produced in an advantageous manner. Such a semiconductor structure is suitable, for example, for producing a semiconductor laser or an LED.
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申请公布号 |
DE3627854(A1) |
申请公布日期 |
1988.02.18 |
申请号 |
DE19863627854 |
申请日期 |
1986.08.16 |
申请人 |
LICENTIA PATENT-VERWALTUNGS-GMBH |
发明人 |
GOTTSMANN,HARTMUT,DIPL.-PHYS.;JUNG,HELMUT,DR.RER.NAT. |
分类号 |
H01S5/20;(IPC1-7):H01S3/05;H01L33/00;H01S3/19 |
主分类号 |
H01S5/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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