发明名称 Gain-controlled light-emitting semiconductor structure, and a method for its production
摘要 The invention relates to a gain-controlled light-emitting semiconductor structure and to a method for its production. In this case, a narrow current path is initially produced with the aid of a V-groove diffusion technology which is known per se. The V-groove is subsequently etched away so that a planar contact-making surface is produced in an advantageous manner. Such a semiconductor structure is suitable, for example, for producing a semiconductor laser or an LED.
申请公布号 DE3627854(A1) 申请公布日期 1988.02.18
申请号 DE19863627854 申请日期 1986.08.16
申请人 LICENTIA PATENT-VERWALTUNGS-GMBH 发明人 GOTTSMANN,HARTMUT,DIPL.-PHYS.;JUNG,HELMUT,DR.RER.NAT.
分类号 H01S5/20;(IPC1-7):H01S3/05;H01L33/00;H01S3/19 主分类号 H01S5/20
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