发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT
摘要 PURPOSE:To prevent the performance of transistors from being deteriorated by forming a contact part of one of the drain regions of two transistors at one end of an active region, forming a contact part of the other of the drain regions at the other end of the active region, and forming a common contact to a common source region at the center. CONSTITUTION:Two transistors (e.g., Q1 and Q3) which have a common source in the islands of active regions (e.g., A). A contact hole 11 with the drain region of the transistor Q1 is formed (to be connected by aluminum wirings to a bit line BL1) at one end of the region A, a contact hole 31 with the drain region of the transistor Q3 is formed (to be connected to a bit line BL2 by aluminum wirings) at the other end of the region A, and a common contact hole 5 (to be connected to common source wirings S) with a common source region is formed at the two transistors Q1, Q3 at the center of the region A.
申请公布号 JPS6338254(A) 申请公布日期 1988.02.18
申请号 JP19860181869 申请日期 1986.08.04
申请人 FUJITSU LTD 发明人 TAGUCHI MASAO
分类号 H01L27/088;H01L21/8234;H01L21/8242;H01L27/10;H01L27/108;H01L27/11 主分类号 H01L27/088
代理机构 代理人
主权项
地址