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发明名称
METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE COMPRISING DIELECTRIC ISOLATION REGIONS
摘要
申请公布号
EP0245538(A3)
申请公布日期
1988.02.17
申请号
EP19860116670
申请日期
1981.07.14
申请人
KABUSHIKI KAISHA TOSHIBA
发明人
IWAI, HIROSHI
分类号
H01L21/762;(IPC1-7):H01L21/76
主分类号
H01L21/762
代理机构
代理人
主权项
地址
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