发明名称 Electrostatic electron gun with integrated electron beam deflection and/or stigmating system
摘要 An ultra-compact electrostatic electron gun includes integrated beam-modifying means for use in electron beam memory systems, electron microscopes, electron lithographic devices and the like. The gun is illustrated as comprising means forming a point source of electrons and means receiving electrons from the point source for defining an electron beam. Electrostatic lens means receives the beam and forms a beam focus. An integrated magnetic field-generating means establishes a field of magnetic flux through the electrostatic lens for modifying the position, cross-sectional shape or other characteristic of the beam. The magnetic field-generating means is adapted to receive static or dynamic control signals and is characterized by comprising means positioned axially coincident with and surrounding the electrostatic lens to effectively immerse substantially the entire lens in the beam-modifying magnetic field, whereby due to the axial coincidence of the magnetic field-generating means with the lens, a characteristic of the electron beam may be modified without the magnetic field-generating adding significantly, if at all, to the axial length of the gun.
申请公布号 US4725736(A) 申请公布日期 1988.02.16
申请号 US19860895200 申请日期 1986.08.11
申请人 ELECTRON BEAM MEMORIES 发明人 CREWE, ALBERT V.
分类号 H01J3/02;H01J37/30;(IPC1-7):H01J3/18;H01J3/32 主分类号 H01J3/02
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