Method for controlling a discharge plasma-based radiation source for stabilizing the radiation dose which is emitted in a pulsed manner.

摘要

A method is disclosed for controlling a discharge plasma-based radiation source. A calibration function (HV(Ep)) is determined as a mathematical relationship between values of an input quantity (7) and values of an operating parameter of the EUV radiation source (3) by applying different values of the input quantity (7) to the EUV radiation source (3) so that a reference value (ERef, URef) is brought about during a pulse of the EUV radiation source (3). A test quantity value is acquired at each pulse of the EUV radiation source (3). Next, a statistical value is formed from a defined quantity of values of the test quantity, and a deviation with the reference value is determined. A result of a comparison of the deviation and continuation after the result determines the point from which the method is repeated. The decision is made based upon compliance with a predefined tolerance range.