| 摘要 |
<p>PURPOSE:To enable work function to become small by using a thin film of specific barium-group hexa-boride for a cold cathode, and preparing said thin film by the use of sputtering method and CVD or plasma CVD method. CONSTITUTION:A thin film of barium-group hexa-boride shown in Ba1-xMexBs (where, Me is one element selected from Sr and rare earth elements, and x satisfies a formula 0<=x<=0.5) is formed on a substrate. For example, a BaB6 Green compact target 2, an anode 3, an Ar-gas ionization chamber 4, a shutter 5, a quartz substrate 6, a heater 7 for heating the substrate are installed in a vacuum bell jar 1. The substrate temperature is then raised to 200 deg.C, and sputtering is performed for about one hour, to form a BaB6 thin film on the quartz substrate 6. Hence, the cold cathode low in work function for an electronic device can be manufactured.</p> |
