| 摘要 |
PROBLEM TO BE SOLVED: To provide a resin and a resist composition from which a resist pattern can be produced with good line edge roughness.SOLUTION: The resin and the resist composition have a structural unit having a cyclic -O-SO-O- structure, such as a structural unit derived from a compound represented by formula (I), and a structural unit having an acid-labile group. In the formula, Rrepresents a hydrogen atom or a methyl group; Xrepresents a trivalent hydrocarbon group having 1 to 24 carbon atoms, in which -CH- included in the hydrocarbon group may be replaced by -O-, -NH- or -CO-, and a hydrogen atom included in the hydrocarbon group may be replaced by a hydroxy group; and Arepresents a single bond, an alkanediyl group having 1 to 6 carbon atoms, or the like.SELECTED DRAWING: None |
