| 摘要 |
PURPOSE:To obtain high resolution of a positive pattern and to improve its sensitivity by forming upper and lower positive resist layers for radiation on the surface of a substrate and adding simultaneously a sensitizer for radiation to the upper layer side. CONSTITUTION:Upper and lower positive resist layers for radiation 3, 2 are formed on the surface of a substrate 1, and a sensitizer for the radiation is added to the upper layer 3. Since in this double-layered positive photoresist, a radiation sensitizer is contained in the upper layer 3, the resolution of the overall resist layer depends on the resolution of the lower layer 2 contacting with the substrate and the sensitivity thereof depends on the upper layer 3 contg. the radiation sensitizer, and the sensitivity of the resist is remarkably improved as compared to a resist contg. no sensitizer. In this way, a resist pattern having superior sensitivity is obtd. without deteriorating its resolution. |
