| 摘要 |
PURPOSE:To decrease the number of processes, and to execute an alignment of a transparent electrode and a dyeable photoresist with high accuracy, by applying the dyeable photoresist immediately before peeling off a photoresist in the final stage of a pattering process of the transparent electrode, and thereafter, peeling off the photoresist for patterning of the transparent electrode, forming a pattern of the dyeable photoresist on a non-electrode part of a glass substrate, and dyeing the pattern of the dyeable photoresist. CONSTITUTION:By applying a dyeable photoresist 15 onto a glass substrate 11, and subsequently, peeling off a photoresist 13, the glass substrate 11 provided with a transparent electrode 12 of an I.T.O. electrode pattern, and a dyeable photoresist 15 having a pattern of a non-electrode part is obtained. Also, by dyeing the dyeable photoresist 15 by a dyeing process, a color filter 16 having a desired pattern is obtained. In the course of a patterning process of the transparent electrode, patterning of the dyeable photoresist is also executed, therefore, the number of processes is decreased. |
