发明名称 COMPLEMENTARY METAL OXIDE FILM SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
摘要 PURPOSE: To enable an internal logic element to be supplied with power with minimal surge, by laying out N-channel MOS transistors whose drain is connected to a supply connection and whose gate and source are grounded, along the periphery of a semiconductor substrate. CONSTITUTION: N-channel MOS transistors 10 whose gate and source are grounded are laid out along a supply connection 1, Therefore, a greater number of transistors can be provided in comparison with prior arts. As a result, the N-channel MOS transistors with the grounded gate and souce having a very large width can be provided in the small gap between the peripheral section including the supply connection 1 and an internal logic element 4. Positive surge from the exterior can be pinched off by the MOS transistors and negative surge can be attenuated by the supply connection 1 as a diode. Thus, the internal logic element 4 can be supplied with stable power.
申请公布号 JPS6329964(A) 申请公布日期 1988.02.08
申请号 JP19860174164 申请日期 1986.07.23
申请人 MITSUBISHI ELECTRIC CORP 发明人 HATA MASAYUKI;NAKAGAWA HIROMASA
分类号 H01L27/06;H01L21/8249;H01L27/092;H01L29/78 主分类号 H01L27/06
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