| 摘要 |
PURPOSE:To synthesize a high-quality hard carbon film, by using an ultraviolet light source in combination with a far ultraviolet light source in the excitation of a hydrocarbon-type gas and a hydrogen-type gas at the time of film formation by means of photoreaction so as to allow the reaction to proceed with low energy. CONSTITUTION:The hydrocarbon-type gas is supplied through a gas-introducing pipe 9 into a reaction chamber 1A and the hydrogen-type gas is also introduced through a hydrogen gas-introducing pipe 16. Then, the inside of the reaction chamber 1A is irradiated by an ultraviolet laser beam 18 and a far ultraviolet laser beam 20 produced, respectively, from an ultraviolet laser device 17 and a far ultraviolet laser device 19. The hydrocarbon-type gas is excited and decomposed by the ultraviolet laser beam 18, so that carbon is deposited on a substrate 2. Hydrogen is excited and activated by the far ultraviolet laser beam 20, so that nonhard graphitic carbon among the deposited carbon is removed. When a hydrogen laser device is used as the light source of the far ultraviolet laser device, active species can be formed in high efficiency and the hard carbon film excellent in film quality can be synthesized. |
