| 摘要 |
PURPOSE:To obtain the titled composition having improved sensitivity, dimensional accuracy and resist pattern shape by incorporating a cresol-novolak resin which is composed of a mixed cresol of m-cresol and p-cresol and has a specific range of a peak area ratio of <13>C-NMR spectral to the titled composition. CONSTITUTION:The titled composition contains a photosensitizer comprising the cresol-novolak resin and naphthoquinone diazide sulfonate as a main component. The cresol-novolak resin is exemplified by a resin which is composed of the mixed cresol of m-cresol and p-cresol and has 0.50-0.90 of the M value shown by the formula derived from <13>C-NMR spectral, M=B/(A+B+C) (wherein A is the peak area of 112.0-114.5ppm, B is the peak area of 114.5-116.5ppm and C is the peak area of 116.5-119.0ppm). Thus, the fine resist pattern having less tendency for generating scattering of quality, high sensitivity, high dimensional accuracy and good resist pattern shape is obtd. |
