发明名称 PHOTOSENSITIVE COMPOUND, PHOTOINTENSIFER COMPOSITION, MAKING THEREOF, PHOTORESIST COMPOSITION AND MAKING OF ARTICLE
摘要 The invention relates to new mixed ester photosensitive compounds and photosensitizer compositions comprised thereof. The photosensitive compounds and photosensitizer compositions are prepared by condensing phenolic compounds with a 1,2-naphthoquinonediazide-4-sulfonic acid halide and an organic acid halide in specific ratios. Photoresist compositions comprising the photosensitive compounds and photosensitizer compositions are also disclosed. The photosensitizer compositions exhibit excellent solution stability and resistance to precipitation when formulated in alkali-soluble resin photoresist compositions. The photoresist compositions have improved shelf life.
申请公布号 JPS6324244(A) 申请公布日期 1988.02.01
申请号 JP19870106500 申请日期 1987.05.01
申请人 HOECHST CELANESE CORP 发明人 ROBAATO II POTOBUIN;JIYONASU OO SENTO ARUBAN;CHIESUTAA JIEE SOBODACHIYA
分类号 G03C1/72;G03F7/022;H01L21/027 主分类号 G03C1/72
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