| 摘要 |
PURPOSE:To enable oxidizing ambient gas for high temperature heat treatment to be used by using a ceramic heater as a main heater in combination with other metallic heaters as other heaters in a heating oven for a hot hydrostatic pressurizing device utilizing oxidizing ambient gas. CONSTITUTION:When an oxide ceramic product 10 to be treated is placed in a heating oven A and is treated by enclosing ambient gas consisting of oxygen gas and inert gas, first, electricity is applied to metallic heaters 2a-2c to heat up, and a ceramic heater 6 is preheated to a temperature at which electricity can be applied through a subsurface heat insulating cylinder 3. Then, electricity is applied to the ceramic heater 6 to generate heat, and the temperature of the inside of a treatment chamber (a) is raised to an adequate heat treating temperature. The heating quantity of a plurality of metallic heaters 2a-2c, divided in vertical direction in the inside of the treatment chamber (a) is controlled, and difference of temperature in the vertical direction inside the treatment chamber (a) is adjusted to maintain the temperature uniform. The inside of heating over A is maintained at a high temperature and abnormal rise of temperature of the metallic heaters 2a-2c is prevented by the subsurface insulating cylinder 3. |
