| 摘要 |
PURPOSE:To obtain an ultrahigh preciseness charged pattern, by a method wherein a part of the thin plate arranged in opposed relation to a substrate, to which a plurality of solid electron beam sources are arranged, at a predetermined interval is constituted of an electron pervious member and electrodes are provided on the thin plate to apply voltage between the electron beam sources to accelerate an electron. CONSTITUTION:Voltage generating electron avalanche multiplying action at a P-N junction is applied to X-electrodes EX1, EX2, EX3... and a Y-electrode EY and, at the same time, voltage having certain magnitude is applied to a lead-out electrode PE to allow electrons e<-> to flow out from electron beam sources EB1, EB2, EB3.... Then, by preliminarily applying voltage of a predetermined value to an acceleration electrode AE, the electrons flowing out from the electron beam sources EB1, EB2, EB3... are accelerated up to desired energy to penetrate through the electron window of a surface plate FP. This electron window is formed of an electron pervious member. By this constitution, an ultrahigh precision charged pattern can be formed. |
