发明名称 |
LASER-BASED SYSTEM FOR THE TOTAL REPAIR OF PHOTOMASKS |
摘要 |
<p>A low power laser-based system for repairing clear and opaque defects in a photomask. The system includes a laser source for providing a beam having a wavelength between 0.40 mu m and 2.0 mu m. The beam is coupled to a computer controlled scanning device which scans the beam across a defective area of the photomask to repair the defect by thermal deposition of micron-size films on the defect or by laser-induced degradation of a polymer coating the defect. Excess metal is removed from the photomask surface via laser vaporization.</p> |
申请公布号 |
EP0165685(A3) |
申请公布日期 |
1988.01.27 |
申请号 |
EP19850303091 |
申请日期 |
1985.05.01 |
申请人 |
GOULD INC. |
发明人 |
YOUNG, PETER L.;OPRYSKO, MODEST M. |
分类号 |
G03F1/56;G03F1/72;H01L21/027;(IPC1-7):G03F1/00 |
主分类号 |
G03F1/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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