Fabrication of devices using phosphorus glasses.

摘要

A fabrication technique is described for making various devices in which a type of glass is used as a surface protection layer. The glass layers (e.g. 35 in FIG. 2) are put down by particle bombardment (generally sputtering or e-beam bombardment) of a phosphorus-containing silicate glass target. <Devices with such layers are also described.> Such glass layers are highly advantageous as encapsulating material, diffusion barrier layers, etc., particularly for optical type devices and certain semiconductor devices. Particularly important is the preparation procedure for the glass target used in the bombardment process. The glass layers are moisture stable, act as excellent barriers against diffusion, and are usable up to quite high temperatures without cracking or peeling. The glass layers also provide long-term protection against atmosphere components including water vapor, oxygen, atmosphere pollution contaminants, etc. Exemplary <>.