| 摘要 |
PCT No. PCT/AU86/00221 Sec. 371 Date Apr. 7, 1987 Sec. 102(e) Date Apr. 7, 1987 PCT Filed Aug. 6, 1986 PCT Pub. No. WO87/00966 PCT Pub. Date Feb. 12, 1987.A method and apparatus for the control of growth of epitaxial alloy films onto a substrate. A uniformity measurement probe (5-6) scans the growing film and controls a corrector gun (9) directing a corrector beam (8) to the film. The probe (5-6) and gun (9) are correlated to determine the relevant characteristics of a point on the growing film and to apply a particular correction. Possible deposition alloys are cadmium, mercury and tellurium with the corrector beam being selected from one or more of these specie. |
