| 摘要 |
PURPOSE:To improve photosensitivity remarkably without thickening a photoconductive film too much by arranging an optical reflection film on the surface on the side reverse to the optical incident side of the photoconductive film through a light-transmitting insulator film. CONSTITUTION:The light-transmitting substrate 11 side is disposed oppositely to a draft surface through a magnification imagery system such as a rod lens array, and a picture on the draft surface lit is imaged onto a photoconductive film 13 in a photoconductive element region R. Reflected light from the draft surface transmits a light-transmitting substrate 11 as shown in the arrow 23 at that time, and is projected to the photoconductive film 13 through an adhesive layer 12, and one part of the quantity of light is absorbed by the photoconductive film 13. Light not absorbed by the photoconductive film 13 and passing between ohmic electrodes 16a, 16b further transmits a light-transmitting insulator film 19, is reflected by an optical reflection film 20, is projected to the photoconductive film 13 again by approximately the same path, and is absorbed by the photoconductive film 13. Accordingly, the quantity of light absorbed by the photoconductive film 13 to the same quantity of light of reflected light from the draft surface is made larger than the state where there is no optical reflection film 20, thus improving photosensitivity. |
