| 摘要 |
Composition for negative photoresist comprising a mixture of a polymeric material (A) and one or more cationic photoinitiators (B) and eventually other in photoresists commonly used components such as solvents, sensitators, etc., wherein the material A consists of a homopolymer, copolymer of a mixture of polymers where acrylamide, methacrylamide or derivatives of these is a part of at least one of the polymers present and also comprising chemical groups which can self- or cocondense with other chemical groups under acid conditions, e.g. acid catalysis, and the material B consists of one or more cationic photoinitiators which can generate acid catalysts such as Brönsteds acids or Lewis acids and use of said negative photoresist are described. |
