MANUFACTURE OF SILICIDE GATE SEMICONDUCTOR DEVICE,申请号JP19860161109-传众专利搜索

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发明名称	MANUFACTURE OF SILICIDE GATE SEMICONDUCTOR DEVICE
摘要
申请公布号	JPS6316671(A)	申请公布日期	1988.01.23
申请号	JP19860161109	申请日期	1986.07.08
申请人	NEC CORP	发明人	KAWACHI TOSHIHIKO
分类号	H01L29/43;H01L21/8238;H01L27/08;H01L27/092;H01L29/423;H01L29/49;H01L29/78	主分类号	H01L29/43
代理机构		代理人
主权项
地址

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