METHOD AND DEVICE FOR PATTERN MASKING

摘要

PURPOSE:To attain the inspection of an object to be inspected having a through hole by pattern matching method by preparing a through hole diameter mask data corresponding to each measured through hole diameter when all measured through hole diameters are judged to be within allowable limit. CONSTITUTION:Binarization image data of an object to be inspected having a through hole 1 is inputted in time series along the direction of main scanning, and the group of binarization image data for plural picture elements arranged in the direction of subscanning is formed successively, and through hole diameter is measured based on through hole data that continue from the position of central picture element of an image data group in the direction of subscanning. Measured through hole diameter is added cumulatively in succession in the direction of main scanning and the area of the through hole is measured, and compared with the maximum allowable value of area and the minimum allowable value of area. When they are within allowable limit, actually measured through hole diameter is compared with maximum allowable diameter and minimum allowable diameter in the direction of main scanning. When they are within allowable limit, a through hole diameter mask data corresponding to each actually measured through hole diameter is prepared successively in the direction of main scanning.