| 摘要 |
PURPOSE:To reduce the deflection of masks as well as to perform a high proximity exposure at a high yield rate on large type masks by a method wherein the masks are fixed to the transparent glass plate which is thicker than the masks through the intermediary of grains. CONSTITUTION:Masks 1 consisting of a glass plate are fixed to a transparent glass plate 5 which is thicker than the masks through the intermediaries of grains 7 and a liquid 6. For example, the masks 1 are pushed against the trans parent: glass plate 5 leaving regular intervals between them by the suction of a suction device 8 of the liquid layer 6 surrounded by the transparent glass plate 5, mask holders 2 and the masks 1, and the masks 1 are fixed without deflection. In this case, the shadow of the grains 7 generated when an exposing operation is performed causes no trouble when the mask device is practically used. The above-mentioned liquid 6 is composed of one or more kinds of water, alcohol, an organic solvent and oil, for example. Also, the grains 4 consist of one or more kinds of a spherical body, a fiber piece and a polydedron, for example. |
