| 摘要 |
PURPOSE:To cut down the cost of an exposure device by removing the number of alignment detecting systems by a method wherein, within a stepper type exposure device, positional data are collected from multiple alignment marks on adjoining shots by one detecting system. CONSTITUTION:The vision 57 of an objective 12 of an alignment detecting system 13 is set up so that both alignment marks (AA) of adjoining shots may be observed simultaneously while any errors in relative positons between reticle and wafer of respective AA marks of existing shot and adjoining shots in a processing circuit 15 are detecting by detecting signals transmitted from the vision 57 to be outputted as erroneous level signals. Therefore, when a position is detected in the number n shot within an alignment system with two objective lenses, the processing circuit 15 outputs erroneous data XLn, YLn, XRn, YRn, XNn-1, YNn-1, XNn+1, YNn+1, where Nn-1 represents erroneous data of AA mark of the (n-1) shots observed in the position of number N shot. Through these procedures, the alignment efficiency can be improved by making organic use of said alignment detecting system 13 and a positioning stage with a high accuracy. |
