| 摘要 |
<p>PURPOSE:To improve maintainability and controlability of a vacuum processing chamber, by making a partition valve between the air and an auxiliary chamber be installed on the side of the air and then making a partition valve between the auxiliary chamber and a vacuum chamber be installed on the side of the auxiliary chamber and besides making the position of the partition valves be formed above the waiting position of an arm. CONSTITUTION:A wafer 6 is carried on the opening of an auxiliary chamber 21 from a cassette or the like on the load side by using a carriage device, and then a wafer tray 31 rises to receive the wafer 6 so that the wafer is mounted on an arm 27 which is moved on the waiting position of the arm inside the auxiliary chamber 21. Successively a cover 33 is closed to vacuumize the auxiliary chamber 21 at its load side by using an exhaustion device 37, and then a partition valve 19 is opened to turn the arm 27 to the position of the valve 19 and be disposed above the waiting position of the arm 13. A partition valve 2 is then lowered to have a vacuum chamber 1 communicate with a processing chamber 3 and to carry the wafer 6 on the mounting surface of an electrode 7. Seccessively a wafer tray 8 is raised and the arm 13 is made to return to its waiting position, thereafter the wafer tray 8 is lowered to mount the wafer 6 on the electrode 7. The partition valve 2 is then raised to form the processing chamber 3 for processing the wafer 6.</p> |
