发明名称 A SEMICONDUCTOR DEVICE HAVING A PRESSURE SENSOR AND A METHOD OF MANUFACTURING SUCH A DEVICE
摘要 The present invention relates to a semiconductor device having a semiconductor pressure sensor, which includes a heavily-doped semiconductor layer having a predetermined impurity concentration gradient and formed at the bottom of a diaphragm (membrane portion). Owing to the presence of this semiconductor layer, a flat diaphragm is formed, and a semiconductor pressure sensor of high precision is provided.
申请公布号 HK788(A) 申请公布日期 1988.01.15
申请号 HK19880000007 申请日期 1988.01.07
申请人 HITACHI, LTD. 发明人 ISAO SHIMIZU;KAZUJI YAMADA
分类号 G01L9/00;H01L29/84;(IPC1-7):H01L21/465;H01L41/00 主分类号 G01L9/00
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