发明名称 Vertical MOS type semiconductor device.
摘要 <p>A vertical MOS transistor which comprises p type base region (22) formed in n type substrate (21), n type source region (23) formed in the base region (22), and source electrode (28). The base region (22) involves first, second and third regions (22a, 22b, 22c). Channel region (26) is formed on the surface of first region (22a), the source region (23) is formed in second region (22b), third region (22c) contacts source electrode (28), and fourth region (22d) of base region (22) extends from third region (22c) so as to divide the source region and contact the channel region.</p>
申请公布号 EP0252236(A2) 申请公布日期 1988.01.13
申请号 EP19870106481 申请日期 1987.05.05
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 MATSUNAGA, TAIRA;KIMURA, TAKASHI;ISHII, TETSUO
分类号 H01L29/772;H01L21/336;H01L29/06;H01L29/78 主分类号 H01L29/772
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