| 摘要 |
PURPOSE:To prevent the film wear of an unexposed part and to improve contrast of an image in case of processing the resist by preprocessing the resist with a basic aqueous solution contg. a quarternary ammonium type cation surface active agent, before developing the positive type photoresist. CONSTITUTION:The quarternary ammonium type positive ion surface active agent is exemplified by tetradecyldimethyl(3-trimethoxysilylpropyl)ammonium chloride, and hexadecyltrimethylammonium chloride, etc. The processing agent is prepared by mixing the surface active agent to an aqueous solution added an org. basic substance such as a tetramethyl(hydroxyethyl) ammonium hydroxide, etc., which makes said aqueous solution to basic. The positive type photoresist is processed with said processing agent before developing it. Thus, the film wear of the unexposed part in the positive type photoresist is reduced, thereby making the pattern to high contrast. |
