发明名称 |
Positive photoresist composition with 1,2 naphthoquinone diazide and novolak resin condensed from mixture of m-cresol, p-cresol, and 2,5-xylenol with formaldehyde |
摘要 |
Disclosed herein is a positive photoresist composition containing (a) a photosensitizer of 1,2-naphthoquinone diazides photosensitive-material comprising an ester of 2,3,4,4'-tetrahydroxybenzophenone in which on the average, not less than two hydroxy groups of 2,3,4,4'-tetrahydroxybenzophenone have been esterified by 1,2-naphthoquinonediazide-5-sulfonic acid and (b) a novolak resin obtained by condensing a mixture of m-cresol, p-cresol and 2,5-xylenol with formaldehyde.
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申请公布号 |
US4719167(A) |
申请公布日期 |
1988.01.12 |
申请号 |
US19860825902 |
申请日期 |
1986.02.04 |
申请人 |
MITSUBISHI CHEMICAL INDUSTRIES LTD. |
发明人 |
MIURA, KONOE;OCHIAI, TAMEICHI;KAMEYAMA, YASUHIRO |
分类号 |
G03C1/72;G03F7/022;G03F7/023;H01L21/027;(IPC1-7):G03C1/60;G03C1/54 |
主分类号 |
G03C1/72 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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