| 摘要 |
PURPOSE:To obtain the titled material having a high definition and a high sensitivity by incorporating an org. silane polymer contg. Si-Si binding in a main chain, and at least one of fluorine atom in a side chain to the titled material. CONSTITUTION:The titled resist comprises the org. silane polymer shown by formulas I and II. In the formula, R1 and R3 are each 1-24C an aliphatic group contg. at least one of fluorine atom, R2, R4, R5 and R6 are each 1-24C an aliphatic group, an aromatic group and an alicyclic group contg. or not contg. fluorine atom, (p), (m) and (n) are each an integer of 10-3,000. The resist material is obtd. by dissolving the silicone composed of the org. silane polymer in an org. solvent, followed by coating the obtd. solution on a substrate made of a silicon wafer. Thus, as said silicone is incorporated to the titled resist material, the resist material having excellent anti-oxygen plasma and oxygen reactive ion etching property is obtd. The titled material is effectively applied to a layer resist process, thereby making it to a good pattern. |
